Título

Quo Vadis Nonlinear Optics? An Alternative and Simple Approach to Third Rank Tensors in Semiconductors

Autor

Adalberto Alejo Molina

Nivel de Acceso

Acceso Abierto

Identificador alterno

issn/2073-8994

Resumen o descripción

It is well understood that nonlinear optical (NLO) phenomena are deeply related to the material’s symmetry. Mathematically, the material symmetry can be described in terms of the nonzero parameters in the nonlinear susceptibility tensors. Generally, more complex structures involve more nonzero parameters in the tensor. The number of parameters increases rapidly if higher NLO orders are considered, complicating the physical analysis. Conventionally, these parameters are obtained via abstract symmetry analysis, e.g., group theory (GT). This work presents a novel theoretical analysis to approach the nonlinear tensor using the simplified bond hyperpolarizability model (SBHM) and compare it with GT. Our analysis is based on a light–matter interaction classical phenomenological physical framework. Rather than just looking at the symmetry of the crystal, the model applies physical considerations requiring fewer independent parameters in the tensor than GT. Such a simplification significantly improves the determination of the surface–bulk SHG contribution factors, which cannot be extracted from the experiment alone. We also show for the case of perovskite that the SHG contribution can be addressed solely from their surface dipoles with only one independent component in the tensor. Therefore, this work may open the path for a similar analysis in other complicated semiconductor surfaces and structures in the future, with potential applications to nanoscale surface characterization and real-time surface deposition monitoring.

Editor

MDPI Open Access Journals

Fecha de publicación

2022

Tipo de publicación

Artículo

Recurso de información

Formato

pdf

Idioma

Inglés

Relación

Symmetry

1

14

https://www.mdpi.com/2073-8994/14/1/127?fbclid=IwAR2Twf7qO94i9RJiwil0x5yK17lydWbsVFiK1NMAUMevNeqZ82marWof5nY

Cobertura

MEX

Audiencia

Investigadores

Repositorio Orígen

Repositorio Institucional de Acceso Abierto de la Universidad Autónoma del Estado de Morelos

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